ULIS Best Paper Award

A SiNANO Best Paper Award (joint SiNANO/ULIS) has been proposed in the framework of the European EuroSOI - ULIS Conference: The SiNANO Institute will sponsor the EuroSOI - ULIS 2017 Conference, which is in the same research area as the research domains of the SiNANO Institute.

• A medal (SiNANO Institute/ULIS logos) will be given every year to the best ULIS paper (first medal given during 2011 for the papers presented at ULIS 2010)
• An award of 300€ will be given to the first author of the best paper
• A USB stick including the ULIS Proceedings (with the SiNANO Institute logo) will also be given to ULIS participant

Previous Years Awardees

3rd SiNANO sponsorship for ULIS'2012 Best Paper Award, Warwick, March 20, 2013

During ULIS'2013, for the 3rd time, the Medal and the Award were given by Francis Balestra to Simon Deleonibus, who received the price for R. Coquand, the author of " Scaling of High-/Metal-Gate Trigate SOI Nanowire Transistors down to 10nm width", the Best ULIS'2012 Paper.

2nd SiNANO sponsorship for ULIS'2011 Best Paper Award, Grenoble, March 6, 2012

During ULIS'2012, for the 2nd time, the Medal and the Award were given by Francis Balestra to Lars Knoll, the author of "20nm gate length Schottky MOSFETs with ultra thin NiSi/epitaxial NiSi2 source/drain", the Best ULIS'2011 Paper.

1st SiNANO sponsorship for ULIS'2010 Best Paper Award, Cork, March 15, 2011

During ULIS'2011, for the first time, the Medal and the Award were given by Francis Balestra to Siegfried Mantl, who received the price for Sebastian Feste, the author of "Effective mass and I-V characterization of biaxially tensile strained SOI MOSFETs", the Best ULIS'2010 Paper.